Researching | Reflection Characteristics Analysis of DBR in 940 nm VCSEL

Chinese Journal of Lasers, Volume. 50, Issue 7, 0701007(2023)

Reflection Characteristics Analysis of DBR in 940 nm VCSEL

Zhipeng Pan^1,2, Wei Li^1、*, Lü Jiagang^1,2, Jinyuan Chang^1,2, Zhennuo Wang^1,2, Suping Liu¹, Li Zhong¹, and Xiaoyu Ma^1,2

Author Affiliations

¹National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

²College of Materials Science and Optoelectronic Technology, University of Chinese Academy of Sciences,Beijing 100049, China

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Zhipeng Pan, Wei Li, Lü Jiagang, Jinyuan Chang, Zhennuo Wang, Suping Liu, Li Zhong, Xiaoyu Ma. Reflection Characteristics Analysis of DBR in 940 nm VCSEL[J]. Chinese Journal of Lasers, 2023, 50(7): 0701007

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Paper Information

Category: laser devices and laser physics

Received: Jul. 7, 2022

Accepted: Aug. 10, 2022

Published Online: Mar. 28, 2023

The Author Email: Li Wei (liwei66@semi.ac.cn)

DOI:10.3788/CJL221034

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology