INFRARED, Volume. 46, Issue 7, 32(2025)

Study on the Influence of Indium Oxide on Flip-Chip Interconnect Quality and Its Removal Method

Hui WANG*, Xiao-yu FENG, Tian OUYANG, and Teng-da MA
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  • North China Research Institute of Electro-Optics, Beijing 100015, China
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    WANG Hui, FENG Xiao-yu, OUYANG Tian, MA Teng-da. Study on the Influence of Indium Oxide on Flip-Chip Interconnect Quality and Its Removal Method[J]. INFRARED, 2025, 46(7): 32

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    Paper Information

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    Received: Oct. 20, 2024

    Accepted: Aug. 12, 2025

    Published Online: Aug. 12, 2025

    The Author Email: WANG Hui (wh19800356080@163.com)

    DOI:10.3969/j.issn.1672-8785.2025.07.005

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