Piezoelectrics & Acoustooptics, Volume. 47, Issue 3, 525(2025)

Research on the Preparation Process of SiC Thin Films Based on Plasma-Enhanced Chemical Vapor Deposition

LI Xinpu1, LI Yongwei2, LI Zhiqiang1, YU Jiangang1, JIA Pinggang1, and LIANG Ting1
Author Affiliations
  • 1Key Laboratory of Micro/Nano Devices and Systems,Ministry of Education,North University of China,Taiyuan 030051,China
  • 2Department of Automation,Taiyuan Institute of Technology,Taiyuan 030051,China
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    References(6)

    [2] [2] LI Mingming,JIANG Lihua,SUN Yihua,et al. Correlation study of photoluminescence properties and mechanism of hydrogenated amorphous silicon carbide films[J]. Journal of Luminescence,2019,212:38-44.

    [5] [5] BARBOUCHE M,BENABDERRAHMANE ZAGHOUANI R,BEN AMMAR N E,et al. Effect of amorphous SiC layer on electrical and optical properties of Al/a-SiC/c-Si Schottky diode for optoelectronic applications[J]. Journal of Materials Science:Materials in Electronics,2021,32(15):20598-20611.

    [6] [6] GREENHORN S,BANO E,STAMBOULI V,et al. Amorphous SiC thin films deposited by plasma-enhanced chemical vapor deposition for passivation in biomedical devices[J]. Materials(Basel),2024,17(5):1135.

    [8] [8] KNAACK G L,MCHAIL D G,BORDA G,et al.In vivocharacterization of amorphous silicon carbide as a biomaterial for chronic neural interfaces[J]. Front Neurosci,2016,10:301.

    [9] [9] MATSUNAMI H,MASAHIRO H,TANAKA T. Structures and physical properties of sputtered amorphous SiC films[J]. Journal of Electronic Materials,1979,8(3):249-260.

    [10] [10] LI Wangwang,LIANG Ting,LIU Wenyi,et al. Interface characteristics comparison of sapphire direct and indirect wafer bonded structures by transmission electron microscopy[J]. Applied Surface Science,2019,494:566-574.ZHANG Qi,LIU Tingting,HAN Mengxu,et al. Deposition process of PECVD Si3N4 thin film[J]. Electronic Process Technology,2024,45(4):48-50.

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    LI Xinpu, LI Yongwei, LI Zhiqiang, YU Jiangang, JIA Pinggang, LIANG Ting. Research on the Preparation Process of SiC Thin Films Based on Plasma-Enhanced Chemical Vapor Deposition[J]. Piezoelectrics & Acoustooptics, 2025, 47(3): 525

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    Paper Information

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    Received: Jan. 23, 2025

    Accepted: --

    Published Online: Jul. 11, 2025

    The Author Email:

    DOI:10.11977/j.issn.1004-2474.2025.03.019

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