Research on the Preparation Process of SiC Thin Films Based on Plasma-Enhanced Chemical Vapor Deposition

LI Xinpu; LI Yongwei; LI Zhiqiang; YU Jiangang; JIA Pinggang; LIANG Ting

doi:10.11977/j.issn.1004-2474.2025.03.019

Piezoelectrics & Acoustooptics, Volume. 47, Issue 3, 525(2025)

Research on the Preparation Process of SiC Thin Films Based on Plasma-Enhanced Chemical Vapor Deposition

LI Xinpu¹, LI Yongwei², LI Zhiqiang¹, YU Jiangang¹, JIA Pinggang¹, and LIANG Ting¹

Author Affiliations

¹Key Laboratory of Micro/Nano Devices and Systems，Ministry of Education，North University of China，Taiyuan 030051，China

²Department of Automation，Taiyuan Institute of Technology，Taiyuan 030051，China

show less

Abstract Get PDF(in Chinese)

Figures & Tables(0)

Tools

Get Citation

Copy Citation Text

LI Xinpu, LI Yongwei, LI Zhiqiang, YU Jiangang, JIA Pinggang, LIANG Ting. Research on the Preparation Process of SiC Thin Films Based on Plasma-Enhanced Chemical Vapor Deposition[J]. Piezoelectrics & Acoustooptics, 2025, 47(3): 525

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category:

Received: Jan. 23, 2025

Accepted: --

Published Online: Jul. 11, 2025

The Author Email:

DOI:10.11977/j.issn.1004-2474.2025.03.019

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology