Investigation and Research on<i></i>Threshold Voltage in IGZO TFT Process

Hui ZHAO; Yanchang WANG; Tao HUA

doi:10.19453/j.cnki.1005-488x.2023.04.013

Optoelectronic Technology, Volume. 43, Issue 4, 351(2023)

Investigation and Research onThreshold Voltage in IGZO TFT Process

Hui ZHAO, Yanchang WANG, and Tao HUA

Author Affiliations

Nanjing BOE Display Technology Co.,Ltd., Nanjing 210033， CHN

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Figures & Tables(7)

Fig. 1. V_TH map

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Fig. 2. Mask-glass position

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Fig. 3. Mask-glass position

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Fig. 4. Plasma distribution

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Fig. 5. Schematic of optimized plasma distribution

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Fig. 6. V_TH fluctuation of different oxygen partial pressures

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Fig. 7. Optimized V_TH map

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Hui ZHAO, Yanchang WANG, Tao HUA. Investigation and Research onThreshold Voltage in IGZO TFT Process[J]. Optoelectronic Technology, 2023, 43(4): 351

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Paper Information

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Received: Feb. 27, 2023

Accepted: --

Published Online: Mar. 21, 2024

The Author Email:

DOI:10.19453/j.cnki.1005-488x.2023.04.013

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology