[1] [1] LIDER V V. Multilayer X-ray interference structures[J]. Physics-Uspekhi, 2019, 62(11): 1063–1095.

[2] [2] RACK A, WEITKAMP T, RIOTTE M, et al. Comparative study of multilayers used in monochromators for synchrotron-based coherent hard X-ray imaging[J]. J Synchrotron Radiat, 2010, 17(4): 496–510.

[3] [3] RACK A, WEITKAMP T, RIOTTE M, et al. Micro-imaging performance of multilayers used as monochromators for coherent hard X-ray synchrotron radiation[J]. Proceedings of SPIE, 2010, 7802: 78020M..

[5] [5] HOSHINO M, UESUGI K, IMAI T. High-energy X-ray micro-laminography to visualize microstructures in dense planar objects[J]. J Synchrotron Radiat, 2023, 30(Pt 2): 400–406.

[6] [6] HUA W Q, YANG C M, ZHOU P, et al. Time-resolved ultra-small- angle X-ray scattering beamline (BL10U1) at SSRF[J]. Nucl Sci Tech, 2024, 35(2): 36.

[7] [7] LIU Y, HUANG Q S, QI R Z, et al. Improvement of the microstructure and X-ray performance of ultrathin Ru/C multilayer mirror after high temperature treatment[J]. Coatings, 2021, 11(1): 45.

[8] [8] LIU Y, HUANG Q S, QI R Z, et al. Microstructure evolution and hard X-ray reflectance of ultrathin Ru/C multilayer mirrors with different layer thicknesses[J]. Mater Res Express, 2021, 8(2): 026401.

[9] [9] PENG J C, LI W B, HUANG Q S, et al. Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films[J]. Sci Rep, 2016, 6: 31522.

[11] [11] BOTZAKAKI M A, SKOULATAKIS G, XANTHOPOULOS N, et al. Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al2O3/p-Ge MOS structures[J]. J Vac Sci Technol A Vac Surf Films, 2018, 36(1): 01A120.

[12] [12] LI Y L, LU W E, WANG S F, et al. Fabrication of multilayer Fresnel zone plate for hard X-ray microscopy by atomic layer deposition and focused ion beam milling[J]. Vacuum, 2023, 209: 111776.

[14] [14] LI Y L, LV W S, KONG X D, et al. Design of a monocapillary with an inner Al2O3/HfO2 multilayer to obtain focused monochromatic hard X-rays[J]. Appl Opt, 2024, 63(11): 2837–2842.

[15] [15] LI Y L, LU W E, LV W S, et al. Hard X-ray HfO2/Al2O3 multilayers fabricated by atomic layer deposition[J]. Thin Solid Films, 2024, 803: 140479.

[17] [17] MARKOV L K, PAVLUCHENKO A S, SMIRNOVA I P, et al. Study of deposition of Al2O3 nanolayers by atomic layer deposition on the structured ITO films[J]. Semiconductors, 2023, 57(5): 257–262.

[18] [18] ZHANG Y C, DING Y Y, CHRISTOFIDES P D. Multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to chamber design[J]. Chem Eng Res Des, 2019, 147: 529–544.

[19] [19] ZHAO J J, GUO Y N, LI S J, et al. Amorphous-crystalline porous ruthenium selenide as highly efficient electrocatalysts for alkaline hydrogen evolution[J]. Chem Eng J, 2024, 485: 150074.