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Journal of the Chinese Ceramic Society, Volume. 53, Issue 4, 958(2025)

HfO2/Al2O3 X-ray Multilayer Prepared of by Atomic Layer Deposition

ZHAO Huibin, LI Yanli*, ZHANG He, NIU Geng, and HAN Li
Author Affiliations
  • Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China
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    ZHAO Huibin, LI Yanli, ZHANG He, NIU Geng, HAN Li. HfO2/Al2O3 X-ray Multilayer Prepared of by Atomic Layer Deposition[J]. Journal of the Chinese Ceramic Society, 2025, 53(4): 958

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    Received: Oct. 22, 2024

    Accepted: May. 29, 2025

    Published Online: May. 29, 2025

    The Author Email: LI Yanli (liyanli@mail.iee.ac.cn)

    DOI:10.14062/j.issn.0454-5648.20240661

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology