Opto-Electronic Engineering, Volume. 49, Issue 11, 220056(2022)

Label-free far-field subdiffraction imaging based on hyperbolic metamaterial

Xuesong Chen1, Wenjuan Du1、*, Zhilang Lou1, and Dongliang Tang2
Author Affiliations
  • 1School of Physics and Optoelectronics, Xiangtan University, Xiangtan, Hunan 411105, China
  • 2Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of Education and Hunan Provincial, Key Laboratory of Low-Dimensional Structural Physics and Devices, School of Physics and Electronics, Hunan University, Changsha, Hunan 410082, China
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    Figures & Tables(8)
    Schematic diagram of frequency shift super-resolution imaging under BPP illumination. (a) Schematic diagram of fourier component detection range under conventional illumination,kc and k'c are transverse wave vectors of illuminating and scattered light, respectively, under conventional illumination; (b) Schematic diagram of fourier component detection range under BPP illumination, keva and k'eva are transverse wave vectors of illuminating and scattered light, respectively, under BPP illumination; (c) Extension of the highest detectable fourier component (from red solid line to green solid line), schematic diagram of frequency shift effect; (d) Schematic of BPP illumination
    BPP structure. (a) Schematic of the BPP structure; (b) OTF of Ag/SiO2 multilayers in TM and TE polarization; (c) OTF for −1、0 and +1 orders; (d) The ratio of OTF for different diffraction orders
    (a)~(c) The OTF of −1, 0, and +1 orders for for different kinc and kg, respectively; (d) The OTF of −1, 0, and +1 orders with 170 nm pitch grating at the incident angle of 18 degree
    (a) The optical intensity distributions in the x–z plane when incidence angles are 18°, 46° and 60°, respectively; (b) The corresponding intensity decay curves away from the illumination surface in (a)
    Far-field imaging simulation processes and results for double-slit structure with center-to center distance of 100 nm under BPP illumination with 2.66k0. (a) The intensity distribution in the x–z plane in FDTD method; (b) Far-field imaging intensity for double-slit structure; (c) Spatial spectrum of double-slit structures; (d) Spatial spectrum of scattered light for double-slit structures in the far field
    (a) The contrast of far-field imaging for double-slit structure with different center-to-center distances illuminated by BPP; (b) The normalized optical intensity for double-slit structure with different center-to-center distances in far-field imaging
    Super-resolution imaging under BPP illumination with transverse wave vector 3.86k0. (a) OTF of Ag/SiO2 multilayers in TM polarization; (b) OTF for −1、0 and +1 orders; (c) Far-field imaging intensity for double-slit structure
    • Table 1. Main parameters reported based on frequency shift principle label-free far-field subdiffraction imaging techniques

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      Table 1. Main parameters reported based on frequency shift principle label-free far-field subdiffraction imaging techniques

      WorkMaterialResolution
      Appl.Phys.Lett. 102, 013104 (2013)Micro-fiber~λ/3.56 (λ=800 nm, NA=0.8)
      Opt Lett. 38(14), 2455 (2013)TIR Prism~λ/2.5 (λ=600 nm, NA=0.8)
      Phys Rev Lett. 118, 076101 (2017)Fluorescent NW~λ/3.7 (λ=520 nm, NA=0.85)
      Opt Lett.46(6), 1265 (2021)Microparticle~λ/1.68 (λ=505 nm, NA=0.9)
      BPP illuminationHMM~λ/7.82 (λ=532 nm, NA=0.85)
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    Xuesong Chen, Wenjuan Du, Zhilang Lou, Dongliang Tang. Label-free far-field subdiffraction imaging based on hyperbolic metamaterial[J]. Opto-Electronic Engineering, 2022, 49(11): 220056

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    Paper Information

    Category: Article

    Received: Apr. 21, 2022

    Accepted: --

    Published Online: Dec. 27, 2022

    The Author Email: Wenjuan Du (wenjuandu@xtu.edu.cn)

    DOI:10.12086/oee.2022.220056

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