Optics and Precision Engineering, Volume. 16, Issue 11, 2204(2008)

Laminated photoresist layer technology and residual stress control for micromirror fabrication

LI Jia-dong1,2、*, ZHANG Ping1, WU Yi-hui1, XUAN Ming1, LIU Yong-shun1, and WANG Shu-rong1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    [10] [10] CAO K,LIU W,TALGHADER J J.Curvature compensation in micromirrors with high reflectivity optical coatings[J].J.MEMS,2001,10(3):409-417

    [11] [11] TUANTRANONT A,BRIGHT V M.Segmented silicon micromachined microelectromechanical deformable mirrors for adaptive optics[J].IEEE Journal on Selected Topics in Quantum Electronics,2002,8(1):33-45

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    LI Jia-dong, ZHANG Ping, WU Yi-hui, XUAN Ming, LIU Yong-shun, WANG Shu-rong. Laminated photoresist layer technology and residual stress control for micromirror fabrication[J]. Optics and Precision Engineering, 2008, 16(11): 2204

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    Paper Information

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    Received: Apr. 7, 2008

    Accepted: --

    Published Online: Feb. 28, 2010

    The Author Email: LI Jia-dong (microsoft1224@163.com)

    DOI:

    CSTR:32186.14.

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