Chinese Journal of Liquid Crystals and Displays, Volume. 36, Issue 2, 258(2021)
Remain of photoresist in halftone process based on TFT-LCD technology
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JIANG Lei, HUANG Xue-yong, LIU Liang-jun, LI Guang-sheng, WANG Jian, LI Xiang-feng, MU Shao-shuai, SHAO Bo. Remain of photoresist in halftone process based on TFT-LCD technology[J]. Chinese Journal of Liquid Crystals and Displays, 2021, 36(2): 258
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Received: Jun. 11, 2020
Accepted: --
Published Online: Mar. 30, 2021
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