Chinese Journal of Liquid Crystals and Displays, Volume. 36, Issue 2, 258(2021)

Remain of photoresist in halftone process based on TFT-LCD technology

JIANG Lei, HUANG Xue-yong, LIU Liang-jun, LI Guang-sheng, WANG Jian, LI Xiang-feng, MU Shao-shuai, and SHAO Bo
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    JIANG Lei, HUANG Xue-yong, LIU Liang-jun, LI Guang-sheng, WANG Jian, LI Xiang-feng, MU Shao-shuai, SHAO Bo. Remain of photoresist in halftone process based on TFT-LCD technology[J]. Chinese Journal of Liquid Crystals and Displays, 2021, 36(2): 258

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    Paper Information

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    Received: Jun. 11, 2020

    Accepted: --

    Published Online: Mar. 30, 2021

    The Author Email:

    DOI:10.37188/cjlcd.2020-0151

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