Chinese Journal of Lasers, Volume. 46, Issue 5, 0508001(2019)

Applications of Ultrafast Photoemission Electron Microscopy in Nanophotonics

Quan Sun1, Shuai Zu1, Kosei Ueno1, Qihuang Gong3, and Hiroaki Misawa1、**
Author Affiliations
  • 11Research Institute for Electronic Science, Hokkaido University, Sapporo 001-0020, Japan
  • 3Department of Physics, Peking University, Beijing 100871, China
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    A brief overview of the basic principles and main applications of ultrafast photoemission electron microscopy is presented in this paper. Then, the progress of our research on ultrafast photoemission electron microscopy, including near-field imaging, near-field spectroscopy, and time-resolved ultrafast dynamics, in the field of nanophotonics, particularly in the field of surface plasmonics, is highlighted. These studies not only help to deepen understanding of the fundamental properties of surface plasmons and the interaction among different modes but also benefit the design and development of surface plasmonic applications. Finally, further potential applications of this technique are prospected.

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    Quan Sun, Shuai Zu, Kosei Ueno, Qihuang Gong, Hiroaki Misawa. Applications of Ultrafast Photoemission Electron Microscopy in Nanophotonics[J]. Chinese Journal of Lasers, 2019, 46(5): 0508001

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    Paper Information

    Category: nonlinear optics

    Received: Dec. 27, 2018

    Accepted: Feb. 18, 2019

    Published Online: Nov. 11, 2019

    The Author Email: Misawa Hiroaki (misawa@es.hokudai.ac.jp)

    DOI:10.3788/CJL201946.0508001

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