Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Chinese Journal of Lasers, Volume. 50, Issue 6, 0605003(2023)

Lithography Illumination System Based on Fourier Synthesis Technology

Hui Li, Xiaobin Wu*, Xiaoquan Han, He Ma, and Pengfei Sha
Author Affiliations
  • R & D Center of Optoelectronic Technology, Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (7)
    Equations (0)
    References (23)
    Cited By (2)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 2 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Hui Li, Xiaobin Wu, Xiaoquan Han, He Ma, Pengfei Sha. Lithography Illumination System Based on Fourier Synthesis Technology[J]. Chinese Journal of Lasers, 2023, 50(6): 0605003

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Beam transmission and control

    Received: Sep. 6, 2022

    Accepted: Oct. 19, 2022

    Published Online: Feb. 14, 2023

    The Author Email: Wu Xiaobin (wuxiaobin@ime.ac.cn)

    DOI:10.3788/CJL221221

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology