193 nm ArF excimer laser lithography as the current mainstream lithography technology, which can realize criticall dimension(CD) less than or equal to 90 nm of integrated circuit technology. The optical field uniformity and the accuracy of the pulse energy is the important index to realize high lithographic quality, so a single pulse energy detecting method for ArF excimer laser based on dark field noise cancellation is proposed to improve energy measurement precision. It can measure the real laser energy by subtracting the energy data of laser pulse detector with the energy data of the dark field energy detector. A dark field noise cancellation control circuit is designed. By controlling the time sequence synchronously, the noise integral part of the energy pulse integral signal result is effectively removed, so as to improve the accuracy of pulse laser energy measurement.