Microelectronics, Volume. 53, Issue 2, 333(2023)

Study on Avalanche Multiplication Factor of 4H-SiC p-n Junction Based on Accurate Impact Ionization Model

XIONG Juncheng1, HUANG Haimemg1,2,3, ZHANG Zimin4, and ZHANG Guoyi2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    References(10)

    [1] [1] KIMOTO T, COOPER J A. Fundamental of silicon carbide technology [M]. Singapore: John Wiley & Sons, 2014.

    [2] [2] ElASSER A, CHOW T P. Silicon carbide benefits and advantages for power electronics circuits and systems [J]. Proceed IEEE, 2002, 90(6): 969-986.

    [3] [3] CHA H Y, SANDVIK P M. Electrical and optical modeling of 4H-SiC avalanche photodiodes [J], Japan J Appl Phys, 2008, 47(7): 5423-5425.

    [4] [4] BADAL A, BLANCO F, ROCCA P L, et al. Characterization of avalanche photodiodes (APDs) for the electromagnetic calorimeter in the ALICE experiment [J]. Nucl Instrum Methods Phys Res A, 2008, 596(1): 122-125.

    [5] [5] MUSIENKO Y. New empirical expression for APD gain vs voltage dependence [J]. J Instrum, 2017, 12(7): C07033.

    [6] [6] MILLER S L. Avalanche breakdown in germanium [J]. Phys Rev, 1955, 99(4): 1234-1241.

    [7] [7] AKTURK A, GOLDSMAN N, ASLAM S, et al. Comparison of 4H-SiC impact ionization models using experiment and self-consistent simulations [J]. J Appl Phys, 2008, 104(2): 026101-1-0.26101-3.

    [8] [8] NG B K, DAVID J P R, TOZER R C, et al. Nonlocal effects in thin 4H-SiC UV avalanche photodiodes [J]. IEEE Trans Elec Dev, 2003, 50(8): 1724-1732.

    [9] [9] RAGHUNATHAN R, BALIGA B. Temperature dependence of hole impact ionization coefficients in 4H and 6H-SiC [J]. Sol Sta Elec, 1999, 43(2): 199-211.

    [10] [10] KONSTANTINOV A O, WAHAB Q, NORDELL N, et al. Ionization rates and critical fields in 4H silicon carbide [J]. Appl Phys Lett, 1997, 71(1): 9091.

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    XIONG Juncheng, HUANG Haimemg, ZHANG Zimin, ZHANG Guoyi. Study on Avalanche Multiplication Factor of 4H-SiC p-n Junction Based on Accurate Impact Ionization Model[J]. Microelectronics, 2023, 53(2): 333

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    Paper Information

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    Received: May. 4, 2022

    Accepted: --

    Published Online: Dec. 15, 2023

    The Author Email:

    DOI:10.13911/j.cnki.1004-3365.220156

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