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Acta Optica Sinica, Volume. 32, Issue 7, 705001(2012)

Fast Simulation Method for Contact Hole Mask in Extreme-Ultraviolet Lithography

Cao Yuting1,2、*, Wang Xiangzhao1, and Bu Yang1,2
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  • 1[in Chinese]
  • 2[in Chinese]
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    Article index updated: Mar. 10, 2025

    The article is cited by 7 article(s) CLP online library. (Some content might be in Chinese.)
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    Cao Yuting, Wang Xiangzhao, Bu Yang. Fast Simulation Method for Contact Hole Mask in Extreme-Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(7): 705001

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    Paper Information

    Category: Diffraction and Gratings

    Received: Jan. 4, 2012

    Accepted: --

    Published Online: May. 31, 2012

    The Author Email: Yuting Cao (cytoe@163.com)

    DOI:10.3788/aos201232.0705001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology