Acta Optica Sinica, Volume. 43, Issue 13, 1312001(2023)

Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Image for Lithographic Projection Lens

Wei Lei1,2, Sikun Li1,2,3、*, Dongchao Pan1,2, Yipeng Jiang1,2, Tong Tong1,3, Xiangzhao Wang1,4、**, and Yang Bu1
Author Affiliations
  • 1Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Department of Microelectronics, Shanghai University, Shanghai 200444, China
  • 4State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, Zhejiang, China
  • show less
    Figures & Tables(23)
    Schematic diagram of optical structure of a lithographic projection system
    Flow chart of AMAI-PCA technology
    Diagram of aerial image and its acquisition. (a) Scanning method of aerial image; (b) simulated aerial image
    Diagram of sensor construction
    Diagram of aerial image offset
    Influence of different factors on wavefront aberration measurement accuracy. (a) Partial coherence; (b) CD; (c) NA; (d) length of sampling length along X/Y; (e) length of sampling length along Z
    Solving results of sensor under different widths
    Experimental results of aerial image reconstruction without sensor. (a) Measured aerial image; (b) reconstructed aerial image; (c) aerial image residual
    Experimental results of aerial image reconstruction with sensor. (a) Measured aerial image; (b) reconstructed aerial image; (c) aerial image residual
    Influence of centering error on wavefront aberration measurement accuracy. (a) X direction; (b) F direction
    Centering accuracy comparison of three-term model and six-term model. (a) X direction; (b) F direction
    Experimental results of aerial image reconstruction before centering. (a) Measured aerial image; (b) reconstructed aerial image; (c) aerial image residual
    Experimental results of aerial image reconstruction after centering. (a) Measured aerial image; (b) reconstructed aerial image; (c) aerial image residual
    Experimental results of two sensors before centering. (a) Measured aerial image of sensor 1; (b) measured aerial image of sensor 2; (c) aerial image residual
    Experimental results of two sensors after centering. (a) Measured aerial image of sensor 1; (b) measured aerial image of sensor 2; (c) aerial image residual
    Diagram of aerial image. (a) Aerial image without noise; (b) aerial image with noise
    Standard deviation image of noise
    Contour diagram and solving accuracy of spatial filtering. (a) Contour diagram; (b) solving accuracy
    Contour diagram and solving accuracy of frequency filtering. (a) Contour diagram; (b) solving accuracy
    Noise reduction effects with different aerial image numbers
    Measurement result of aberration drift. (a) Drift; (b) error of drift
    • Table 1. Simulation settings

      View table

      Table 1. Simulation settings

      Simulation parameterNumerical value
      Wavelength λ /nm248
      Partial coherence σ0.65
      NA0.75
      CD /nm250
      Zernike coefficients range mλ-20-20
      Length of aerial image along X Y)/nm1800
      Length of aerial image along Z /nm7000
      Sampling number along XY61
      Sampling number along Z57
    • Table 2. Variable settings

      View table

      Table 2. Variable settings

      VariableRange of numerical value
      Partial coherence σ0.35-0.95
      NA0.55-0.90
      CD /nm200-300
      Length of aerial image along XY)/nm900-1800
      Length of aerial image along Z /nm3000-7000
    Tools

    Get Citation

    Copy Citation Text

    Wei Lei, Sikun Li, Dongchao Pan, Yipeng Jiang, Tong Tong, Xiangzhao Wang, Yang Bu. Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Image for Lithographic Projection Lens[J]. Acta Optica Sinica, 2023, 43(13): 1312001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jan. 11, 2023

    Accepted: Feb. 23, 2023

    Published Online: Jul. 12, 2023

    The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

    DOI:10.3788/AOS230464

    Topics