Acta Optica Sinica, Volume. 43, Issue 13, 1312001(2023)

Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Image for Lithographic Projection Lens

Wei Lei1,2, Sikun Li1,2,3、*, Dongchao Pan1,2, Yipeng Jiang1,2, Tong Tong1,3, Xiangzhao Wang1,4、**, and Yang Bu1
Author Affiliations
  • 1Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Department of Microelectronics, Shanghai University, Shanghai 200444, China
  • 4State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, Zhejiang, China
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    Wei Lei, Sikun Li, Dongchao Pan, Yipeng Jiang, Tong Tong, Xiangzhao Wang, Yang Bu. Wavefront Aberration Measurement Technique Based on Principal Component Analysis of Aerial Image for Lithographic Projection Lens[J]. Acta Optica Sinica, 2023, 43(13): 1312001

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jan. 11, 2023

    Accepted: Feb. 23, 2023

    Published Online: Jul. 12, 2023

    The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

    DOI:10.3788/AOS230464

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