Spectroscopy and Spectral Analysis, Volume. 37, Issue 8, 2560(2017)
Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source
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XU Qiang, ZHAO Yong-peng, WANG Qi, YANG Yong-tao. Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source[J]. Spectroscopy and Spectral Analysis, 2017, 37(8): 2560
Received: Nov. 24, 2015
Accepted: --
Published Online: Aug. 30, 2017
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