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Spectroscopy and Spectral Analysis, Volume. 37, Issue 8, 2560(2017)

Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source

XU Qiang1, ZHAO Yong-peng2, WANG Qi2, and YANG Yong-tao1
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  • 1[in Chinese]
  • 2[in Chinese]
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    XU Qiang, ZHAO Yong-peng, WANG Qi, YANG Yong-tao. Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source[J]. Spectroscopy and Spectral Analysis, 2017, 37(8): 2560

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    Paper Information

    Received: Nov. 24, 2015

    Accepted: --

    Published Online: Aug. 30, 2017

    The Author Email:

    DOI:10.3964/j.issn.1000-0593(2017)08-2560-04

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology