Acta Optica Sinica, Volume. 26, Issue 5, 767(2006)

Controlling the Duty Cycle of Photoresist Gratings by Setting the Guided-Wave Coupling Angles in Monitoring of Photoresist Development

[in Chinese]*, [in Chinese], and [in Chinese]
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    References(13)

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    [9] [9] Marciante J R, Farmiga N O, Hirsh J I et al.. Optical measurement of depth and duty cycle for binary diffraction gratings with subwavelength features[J]. App. Opt., 2003, 42(16): 3234~3240

    [10] [10] Li Lifeng, Zeng Lijiang. Measurement of duty cycle of photoresist grating masks made on top of multilayer dielectric stacks[J]. Appl. Opt., 2005, 44(21): 1~7 (to be published)

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    CLP Journals

    [1] Han Jian, Bayanheshig, Li Wenhao, Kong Peng. Profile Evolution of Grating Masks According to Exposure Dose and Interference Fringe Contrast in the Fabrication of Holographic Grating[J]. Acta Optica Sinica, 2012, 32(3): 305001

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    [in Chinese], [in Chinese], [in Chinese]. Controlling the Duty Cycle of Photoresist Gratings by Setting the Guided-Wave Coupling Angles in Monitoring of Photoresist Development[J]. Acta Optica Sinica, 2006, 26(5): 767

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    Paper Information

    Category: Physical Optics

    Received: Mar. 20, 2005

    Accepted: --

    Published Online: Jun. 1, 2006

    The Author Email: (greatlin02@gmail.com)

    DOI:

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