Optoelectronic Technology, Volume. 43, Issue 3, 212(2023)

Liquid Deposition Method of Hafnium Oxide Thin Films

Yifeng LIU1,2, Junyang NIE4, Kaixin ZHANG1,2, Chang LIN1,2, Min LI2, Qun YAN1,2,5, and Jie SUN1,2,3
Author Affiliations
  • 1National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN
  • 2Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China,Fuzhou 350100, CHN
  • 3Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden
  • 4Faculty of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an71009, CHN
  • 5Rich Sense Electronics Technology Co., Ltd., Quanzhou Fujian 362200, CHN
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    Yifeng LIU, Junyang NIE, Kaixin ZHANG, Chang LIN, Min LI, Qun YAN, Jie SUN. Liquid Deposition Method of Hafnium Oxide Thin Films[J]. Optoelectronic Technology, 2023, 43(3): 212

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    Paper Information

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    Received: Nov. 28, 2022

    Accepted: --

    Published Online: Mar. 21, 2024

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2023.03.005

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