Liquid Deposition Method of Hafnium Oxide Thin Films

Yifeng LIU; Junyang NIE; Kaixin ZHANG; Chang LIN; Min LI; Qun YAN; Jie SUN

doi:10.19453/j.cnki.1005-488x.2023.03.005

Optoelectronic Technology, Volume. 43, Issue 3, 212(2023)

Liquid Deposition Method of Hafnium Oxide Thin Films

Yifeng LIU^1,2, Junyang NIE⁴, Kaixin ZHANG^1,2, Chang LIN^1,2, Min LI², Qun YAN^1,2,5, and Jie SUN^1,2,3

¹National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN

²Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China,Fuzhou 350100, CHN

³Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden

⁴Faculty of Electronic and Information Engineering, Xi’an Jiaotong University, Xi’an71009, CHN

⁵Rich Sense Electronics Technology Co., Ltd., Quanzhou Fujian 362200, CHN

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Figures & Tables(5)

Fig. 1. Process flow chart for preparing thin HfO₂ films by the liquid deposition method

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Fig. 2. The change of growth solution standing for 6 hours and Tyndall phenomenon

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Fig. 3. The SEM images of the three HfO₂ thin films

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Fig. 4. Elemental composition analysis of HfO₂ films

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Fig. 5. Performance test of HfO₂ thin films

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Yifeng LIU, Junyang NIE, Kaixin ZHANG, Chang LIN, Min LI, Qun YAN, Jie SUN. Liquid Deposition Method of Hafnium Oxide Thin Films[J]. Optoelectronic Technology, 2023, 43(3): 212

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Paper Information

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Received: Nov. 28, 2022

Accepted: --

Published Online: Mar. 21, 2024

The Author Email:

DOI:10.19453/j.cnki.1005-488x.2023.03.005

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology