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Chinese Optics Letters, Volume. 17, Issue 6, 062201(2019)

Nonuniform self-imaging of achromatic Talbot lithography

Huijuan Xia1,2, Shumin Yang1,3、*, Liansheng Wang1,3, Jun Zhao1,3, Chaofan Xue1,3, Yanqing Wu1,3、**, and Renzhong Tai1,3、***
Author Affiliations
  • 1Shanghai Institute of Applied Physics, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Shanghai 201204, China
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    CLP Journals

    [1] Rui Yang, Zhenfa Xue, Zhiyong Shi, Liqiang Zhou, Linwei Zhu, "Scalable Talbot effect of periodic array objects," Chin. Opt. Lett. 18, 030501 (2020)

    [2] Jian Chen, Guoliang Chen, Qiwen Zhan, "Self-aligned fiber-based dual-beam source for STED nanolithography," Chin. Opt. Lett. 19, 072201 (2021)

    Cited By

    [1] Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF. International Journal of Extreme Manufacturing, 2, 012005(2020).

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    Huijuan Xia, Shumin Yang, Liansheng Wang, Jun Zhao, Chaofan Xue, Yanqing Wu, Renzhong Tai, "Nonuniform self-imaging of achromatic Talbot lithography," Chin. Opt. Lett. 17, 062201 (2019)

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jan. 18, 2019

    Accepted: Mar. 1, 2019

    Posted: Mar. 22, 2019

    Published Online: Jun. 5, 2019

    The Author Email: Shumin Yang (yangshumin@sinap.ac.cn), Yanqing Wu (wuyanqing@sinap.ac.cn), Renzhong Tai (tairenzhong@sinap.ac.cn)

    DOI:10.3788/COL201917.062201

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology