Researching | Nonuniform self-imaging of achromatic Talbot lithography

Chinese Optics Letters, Volume. 17, Issue 6, 062201(2019)

Nonuniform self-imaging of achromatic Talbot lithography

Huijuan Xia^1,2, Shumin Yang^1,3、*, Liansheng Wang^1,3, Jun Zhao^1,3, Chaofan Xue^1,3, Yanqing Wu^1,3、**, and Renzhong Tai^1,3、***

Author Affiliations

¹Shanghai Institute of Applied Physics, Shanghai 201800, China

²University of Chinese Academy of Sciences, Beijing 100049, China

³Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Shanghai 201204, China

show less

Full Text Get PDF

Figures&Tables (5)

References (43)

Paper Information

Cited By

Article index updated: Mar. 8, 2024

Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.

The article is cited by 4 article(s) from Web of Science.

Tools

Get Citation

Copy Citation Text

Huijuan Xia, Shumin Yang, Liansheng Wang, Jun Zhao, Chaofan Xue, Yanqing Wu, Renzhong Tai, "Nonuniform self-imaging of achromatic Talbot lithography," Chin. Opt. Lett. 17, 062201 (2019)

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Optical Design and Fabrication

Received: Jan. 18, 2019

Accepted: Mar. 1, 2019

Posted: Mar. 22, 2019

Published Online: Jun. 5, 2019

The Author Email: Shumin Yang (yangshumin@sinap.ac.cn), Yanqing Wu (wuyanqing@sinap.ac.cn), Renzhong Tai (tairenzhong@sinap.ac.cn)

DOI:10.3788/COL201917.062201

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology