Acta Optica Sinica, Volume. 42, Issue 1, 0114003(2022)

Quantum Well Intermixing of 915 nm InGaAsP/GaAsP Primary Epitaxial Wafers

Tianjiang He1,2, Hongqi Jing1、*, Lingni Zhu1, Suping Liu1, and Xiaoyu Ma1,2
Author Affiliations
  • 1National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • 2College of Materials Science and Opto-Electronics, University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(8)
    In and Ga compositions varying with diffusion length. (a) In composition; (b) Ga composition
    Plane diagram of relationship among band gap Eg, lattice constant a, composition x and composition y of GaxIn1-xPyAs1-y at temperature of 300 K[13]
    Epitaxial structure diagram of sample grown by MOCVD
    PL spectra of full epitaxial structure and primary epitaxial structure
    PL spectra at different annealing temperatures
    Peak values and FWHMs of PL spectra at different temperatures
    PL spectrum varying with annealing cycle
    Peak values and FWHMs of PL spectra at different annealing cycles
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    Tianjiang He, Hongqi Jing, Lingni Zhu, Suping Liu, Xiaoyu Ma. Quantum Well Intermixing of 915 nm InGaAsP/GaAsP Primary Epitaxial Wafers[J]. Acta Optica Sinica, 2022, 42(1): 0114003

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Jun. 18, 2021

    Accepted: Jul. 19, 2021

    Published Online: Dec. 22, 2021

    The Author Email: Jing Hongqi (jinghq@semi.ac.cn)

    DOI:10.3788/AOS202242.0114003

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