Chinese Journal of Lasers, Volume. 50, Issue 13, 1304006(2023)

Measurement Method for Numerical Aperture of Projection Lens Based on Ronchi Lateral Shearing Interferometry

Yunjun Lu1,2, Zhongliang Li1,2、*, Feng Tang1, and Xiangzhao Wang1
Author Affiliations
  • 1Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    References(24)

    [1] Malacara D[M]. Optical shop testing(2007).

    [2] Wang Y H, Yao Y F, Li J R et al. Progresses of shearography: key technologies and applications[J]. Laser & Optoelectronics Progress, 59, 1415004(2022).

    [3] Luo J M, Gu J W, Li J H et al. Error analysis and improvement of liquid refractive index measurement using laser speckle interferometry[J]. Laser & Optoelectronics Progress, 59, 0512001(2022).

    [4] Zhao D E, Li N L, Ma Y Y et al. Characteristics of double-vortex optical interferogram based on shearing interference[J]. Laser & Optoelectronics Progress, 58, 1108001(2021).

    [5] Braat J, Janssen A J E M. Improved Ronchi test with extended source[J]. Journal of the Optical Society of America A, 16, 131-140(1999).

    [6] Ray-Chaudhuri A K, Nissen R P, Krenz K D et al. Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras[J]. Proceedings of SPIE, 2536, 99-104(1995).

    [7] Flagello D G, Socha R J, Shi X L et al. Optimizing and enhancing optical systems to meet the low k1 challenge[J]. Proceedings of SPIE, 5040, 139-150(2003).

    [8] Lai K, Gallatin G M, van de Kerkhof M A et al. New paradigm in lens metrology for lithographic scanner: evaluation and exploration[J]. Proceedings of SPIE, 5377, 160-171(2004).

    [9] de Boeij W P, Pieternella R, Bouchoms I et al. Extending immersion lithography down to 1x nm production nodes[J]. Proceedings of SPIE, 8683, 86831L(2013).

    [10] Zhu W H, Miyakawa R H, Naulleau P et al. Lateral shearing interferometry for high-NA EUV wavefront metrology[J]. Proceedings of SPIE, 10809, 108091S(2018).

    [11] Miyakawa R, Naulleau P. Lateral shearing interferometry for high-resolution EUV optical testing[J]. Proceedings of SPIE, 7969, 796939(2011).

    [12] Rimmer M P. Method for evaluating lateral shearing interferograms[J]. Applied Optics, 13, 623-629(1974).

    [13] Dai F Z, Tang F, Wang X Z et al. Modal wavefront reconstruction based on Zernike polynomials for lateral shearing interferometry: comparisons of existing algorithms[J]. Applied Optics, 51, 5028-5037(2012).

    [14] Dai F Z, Tang F, Wang X Z et al. Generalized zonal wavefront reconstruction for high spatial resolution in lateral shearing interferometry[J]. Journal of the Optical Society of America A, 29, 2038-2047(2012).

    [15] Li P, Tang F, Wang X Z. Compensated differential Zernike fitting method for wavefront aberration metrology based on grating lateral shearing[J]. Applied Optics, 61, 1-9(2022).

    [16] Zhao K H, Zhong X H[M]. Optics(1984).

    [18] Born M, Wolf E[M]. Principles of optics. Yang J S, Transl, 474-479(2016).

    [19] Lu Y J, Tang F, Su R et al. (3N+1)-frame phase retrieval for double-grating Ronchi lateral shearing interferometry[J]. Optics and Lasers in Engineering, 158, 107139(2022).

    [20] Dubra A, Paterson C, Dainty C. Wave-front reconstruction from shear phase maps by use of the discrete Fourier transform[J]. Applied Optics, 43, 1108-1113(2004).

    [21] Servin M, Malacara D, Marroquin J L. Wave-front recovery from two orthogonal sheared interferograms[J]. Applied Optics, 35, 4343-4348(1996).

    [22] Li J. Research on grating shearing interference wavefront measurement technology[D], 52-58(2016).

    [23] Li J, Tang F, Wang X Z et al. Wavefront reconstruction for lateral shearing interferometry based on difference polynomial fitting[J]. Journal of Optics, 17, 065401(2015).

    [24] Harbers G, Kunst P J, Leibbrandt G W. Analysis of lateral shearing interferograms by use of Zernike polynomials[J]. Applied Optics, 35, 6162-6172(1996).

    [25] van Brug H. Zernike polynomials as a basis for wave-front fitting in lateral shearing interferometry[J]. Applied Optics, 36, 2788-2790(1997).

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    Yunjun Lu, Zhongliang Li, Feng Tang, Xiangzhao Wang. Measurement Method for Numerical Aperture of Projection Lens Based on Ronchi Lateral Shearing Interferometry[J]. Chinese Journal of Lasers, 2023, 50(13): 1304006

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    Paper Information

    Category: Measurement and metrology

    Received: Dec. 19, 2022

    Accepted: Feb. 8, 2023

    Published Online: Jul. 5, 2023

    The Author Email: Li Zhongliang (lizhongliang@siom.ac.cn)

    DOI:10.3788/CJL221546

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