[1] 承骜, 赵国强, 张若冰. 基于自然图像模型微调的小鼠脑部电镜图像实例分割[J]. 光学 精密工程, 32, 2836-2845(2024).

     CHENG A, ZHAO G Q, ZHANG R B et al. Instance segmentation of mouse brain scanning electron microscopy images based on fine-tuning nature image model[J]. Opt. Precision Eng., 32, 2836-2845(2024).

[2] DUAN H G, DAI P, ZHANG SH et al. Realization of complex patterns via “sketch and peel” lithography[J]. Opt. Precision Eng., 27, 584-593(2019).

     段辉高, 戴彭, 张轼. 复杂图案轮廓曝光版图的生成及工艺实现[J]. 光学 精密工程, 27, 584-593(2019).

[3] MEINERTZHAGEN I A, O’NEIL S D. Synaptic organization of columnar elements in the lamina of the wild type in Drosophila melanogaster[J]. Journal of Comparative Neurology, 305, 232-263(1991).

[4] HARRIS K M, STEVENS J K. Dendritic spines of CA 1 pyramidal cells in the rat hippocampus： serial electron microscopy with reference to their biophysical characteristics[J]. The Journal of Neuroscience, 9, 2982-2997(1989).

[5] BRIGGMAN K L, BOCK D D. Volume electron microscopy for neuronal circuit reconstruction[J]. Current Opinion in Neurobiology, 22, 154-161(2012).

[6] PLATZGUMMER E, KLEIN C, LOESCHNER H. Electron multibeam technology for mask and wafer writing at 0.1 nm address grid[J]. Nanolithography， MEMS， and MOEMS, 12(2013).

[7] YASUDA J, NOMURA H, MATSUMOTO H et al. Recent progress and future of electron multi-beam mask writer[J]. Japanese Journal of Applied Physics, 62(2023).

[8] KASPROWICZ B S, BUCK P D, KLEIN C et al[M]. MBMW-101： World's 1st High-throughput Multi-beam Mask Writer(2016).

[9] KIEVITS A J, PETER DUINKERKEN B H, LANE R et al. FAST-EM array tomography： a workflow for multibeam volume electron microscopy[J]. Methods in Microscopy, 1, 49-64(2024).

[10] LENA EBERLE A, SCHALEK R, LICHTMAN J W et al. Multiple-beam scanning electron microscopy[J]. Microscopy Today, 23, 12-19(2015).

[11] High Productivity Multicolumn E-Beam Lithography[webpage]. https：// multibeamcorp.com/

[12] MOHAMMADI-GHEIDARI A. 196 Beams in a Scanning Electron Microscope[D](2013).

[13] 张利新, 赵伟霞, 陈代谢. 多束电子光学系统的研究现状与发展[J]. 电子显微学报, 42, 376-385(2023).

     ZHANG L X, ZHAO W X, CHEN D X et al. The current states and progress of multi-beam electron optical systems[J]. Journal of Chinese Electron Microscopy Society, 42, 376-385(2023).

[14] ZHANG L X, SUN B T, LIU X Y et al. Design and experiment of micro-arrayed beam blanker[J]. Opt. Precision Eng., 32, 2061-2069(2024).

     张利新, 孙博彤, 刘星云. 微型阵列束闸设计与实验[J]. 光学 精密工程, 32, 2061-2069(2024).

[15] TUGGLE D W, SWANSON L W. Emission characteristics of the ZrO/W thermal field electron source[J]. Journal of Vacuum Science & Technology B： Microelectronics Processing and Phenomena, 3, 220-223(1985).

[16] VAN BRUGGEN M J, VAN SOMEREN B, KRUIT P. Development of a multi-electron-beam source for sub-10nm electron beam induced deposition[J]. Journal of Vacuum Science & Technology B： Microelectronics and Nanometer Structures Processing， Measurement， and Phenomena, 23, 2833-2839(2005).

[17] MIYASHITA H, TOMONO E, KAWAI Y et al. Fabrication of einzel lens array with one-mask reactive ion etching process for electron micro-optics[J]. Japanese Journal of Applied Physics, 50, 106503(2011).

[18] WICKI F, LONGCHAMP J N, ESCHER C et al. Design and implementation of a micron-sized electron column fabricated by focused ion beam milling[J]. Ultramicroscopy, 160, 74-79(2016).

[19] NAGAE K, SHIMADA Y et al. Fabrication of an electrostatic lens array with separate electrodes and shield membranes using the UV-LIGA process[J]. Sensors and Actuators A： Physical, 97/98, 416-421(2002).

[20] SUWAL O K, SHARMA A, LEE Y B et al. Influence of einzel lens structure on the performance of a microcolumn fabricated through MEMS technology[J]. Advanced Materials Research, 694/695/696/697, 1001-1007(2013).

[21] SHI Y, ARDANUC S, LAL A. Micro-Einzel lens for wafer-integrated electron beam actuation[C], 20, 2013(2013).

[22] ZHANG L X, ZHANG Y L, ZHAO W X et al. Accuracy requirements of the microarrayed einzel lens[J]. Journal of Vacuum Science & Technology B, 40(2022).