Optics and Precision Engineering, Volume. 33, Issue 5, 741(2025)

Design and experiment of multi-beam electron source

Weixia ZHAO1,2, Lingchao BAI1,3, Lixin ZHANG1、*, Junbiao LIU1,2, Bohua YIN1,2, and Li HAN1,2
Author Affiliations
  • 1Research Department of Micro-nano Fabrication Technology and Intelligent Electronic Devices, Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing0090, China
  • 2School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing100049, China
  • 3School of Instrument Science and Optoelectronics Engineering, Beijing Information Science and Technology University, Beijing100192, China
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    Figures & Tables(18)
    Schematic design of multi-beam electron source
    Schematic diagram of collimating lens and the off-axis beamlet deflection error
    Mechanical design of collimator lens
    Collimated electron beam trajectories and spot sizes on different planes
    Mechanical design of aperture plate and micro-arrayed einzel lens
    Fabrication process of micro-arrayed aperture plate
    SEM images of aperture plate
    Assembly setup and image of completed unit
    Image of multi-beam electron gun and multi-beam experimental platform
    Schematic diagram for validation of collimator lens
    Single spots and beamlets before and after collimation
    Distribution of beam half-angles with position before and after collimation
    Intensity distribution of beamlet spots in x and y directions
    Variation of beamlet spots with focusing voltage
    • Table 1. Simulation parameters and resulting performance of collimator lens

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      Table 1. Simulation parameters and resulting performance of collimator lens

      仿真参数
      内径/mm3
      厚度/mm1
      极板间距/mm1
      上下极板电压/V4 500
      中间极板电压/V660
      束斑直径/μm622.5
      束半角/mrad1.50
      总束流/μA2.31
      束流密度/(A·m-27.60
    • Table 2. Calculated half-angles of 8×8 beamlets

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      Table 2. Calculated half-angles of 8×8 beamlets

      列数行数
      23456789
      30.000.230.450.630.810.930.940.82
      40.170.250.430.590.740.850.830.70
      50.300.310.420.570.660.720.660.47
      60.370.360.440.500.570.550.460.18
      70.350.360.390.420.410.320.14-0.23
      80.220.240.230.200.13-0.03-0.33-0.82
      9-0.09-0.07-0.10-0.17-0.32-0.58-1.02-1.71
      10-0.63-0.60-0.64-0.78-1.05-1.44-2.07-3.08
    • Table 3. Parameters of focused 3×3 beamlet spots under focusing voltage of 1 500 V

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      Table 3. Parameters of focused 3×3 beamlet spots under focusing voltage of 1 500 V

      束斑编号

      束斑直径

      /μm

      束斑强度束斑间距/μm
      x方向y方向
      15.29234.6861.1660.05
      25.01232.3562.1261.41
      35.28238.08-61.73
      45.59243.7261.0661.52
      55.50239.2359.5660.63
      65.61225.40-61.06
      75.22235.8262.59-
      85.19223.5762.14-
      95.23230.99--
    • Table 4. Variation of beamlet spots with focusing voltage

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      Table 4. Variation of beamlet spots with focusing voltage

      聚焦

      电压/V

      束斑

      直径/μm

      束斑

      间距/μm

      偏移量/μm
      x方向y方向
      019.4265.500.000.00
      60018.1166.24-4.02-0.61
      90015.2463.76-7.81-1.81
      1 20011.6762.77-10.78-2.22
      1 5005.5061.25-13.47-3.28
      1 8009.2259.54-17.04-5.11
      2 10021.8956.93-20.85-6.86
      2 40042.4654.14-24.43-9.80
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    Weixia ZHAO, Lingchao BAI, Lixin ZHANG, Junbiao LIU, Bohua YIN, Li HAN. Design and experiment of multi-beam electron source[J]. Optics and Precision Engineering, 2025, 33(5): 741

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    Paper Information

    Category:

    Received: Nov. 20, 2024

    Accepted: --

    Published Online: May. 20, 2025

    The Author Email: Lixin ZHANG (zhanglx@mail.iee.ac.cn)

    DOI:10.37188/OPE.20253305.0741

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