To enhance the throughput of single-beam devices， such as scanning electron microscopes， a multi-beam electron source system utilizing a Schottky gun was developed. This study encompasses the design methodologies and fabrication processes for the collimator lens， aperture array， and micro-arrayed electrostatic lenses. The electrostatic collimator lens was designed based on the emission characteristics of the Schottky cathode， and the performance of the collimated beam was subsequently calculated. Aperture arrays， including configurations of 3×3 and 10×10 for beam splitting， were fabricated utilizing MEMS technology， and a high-precision assembly system was established to enable the assembly of micro-arrayed electrostatic lenses. Experiments concerning beam collimation， splitting， and focusing were conducted on a dedicated multi-beam electron source experimental platform， validating the performance of the 3×3 multibeam electron source. Experimental results indicate that the collimated spot size was measured to be 600 μm with a beam current density of 4.11 A/m² and a uniformity of 6.06%. The average diameter of the focused beamlet is recorded at 5.32 μm， accompanied by size uniformity of 5.91%， intensity uniformity of 4.36%， and pitch uniformity of 3.06%， all of which meet the design criteria of the multi-beam setup.