Chinese Journal of Lasers, Volume. 36, Issue 6, 1545(2009)

1064 nm Laser Conditioning Effect of HfO2/SiO2 High Reflectors Deposited by E-Beam

Liu Xiaofeng*, Li Dawei, Li Xiao, Zhao Yuan’an, and Shao Jianda
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    Liu Xiaofeng, Li Dawei, Li Xiao, Zhao Yuan’an, Shao Jianda. 1064 nm Laser Conditioning Effect of HfO2/SiO2 High Reflectors Deposited by E-Beam[J]. Chinese Journal of Lasers, 2009, 36(6): 1545

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    Paper Information

    Category: materials and thin films

    Received: Sep. 18, 2008

    Accepted: --

    Published Online: Jun. 8, 2009

    The Author Email: Xiaofeng Liu (xiaofeng198225@163.com)

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