Chinese Journal of Lasers, Volume. 36, Issue 6, 1545(2009)
1064 nm Laser Conditioning Effect of HfO2/SiO2 High Reflectors Deposited by E-Beam
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Liu Xiaofeng, Li Dawei, Li Xiao, Zhao Yuan’an, Shao Jianda. 1064 nm Laser Conditioning Effect of HfO2/SiO2 High Reflectors Deposited by E-Beam[J]. Chinese Journal of Lasers, 2009, 36(6): 1545
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