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Chinese Optics Letters, Volume. 8, Issue 11, 1082(2010)

All-reflective optical system design for extreme ultraviolet lithography

Jun Chang1, Meifang Zou1, Ruirui Wang1, Shulong Feng2, and M. M. Talha1
Author Affiliations
  • 1Laboratory of Optoelectronics Technology and Information System, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China
  • 2Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 343100, China
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    References(10)

    [1] [1] L. Qiu, Microfabrication Technol (in Chinese) (2) 1(2003).

    [2] [2] K. Murakami, T. Oshino, H. Kondo, H. Chiba, H. Komatsuda, K. Nomura, and H. Iwata, Proc. SPIE 6517, 65170J (2007).

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    CLP Journals

    [1] Cao Yuting, Wang Xiangzhao, Bu Yang, Liu Xiaolei. Analysis of Mask Shadowing Effects in Extreme-Ultraviolet Lithography[J]. Acta Optica Sinica, 2012, 32(8): 805001

    [2] Jun Chang, Wubin He, Ruirui Wang, Shulong Feng, "Optical system design with conformal decentered and tilted elements," Chin. Opt. Lett. 9, 032201 (2011)

    [3] Xu Weicai, Huang Wei, Yang Wang. Magnification Tolerancing and Compensation for the Lithographic Projection Lens[J]. Acta Optica Sinica, 2011, 31(11): 1122003

    [4] Ruigang Li, "Measurement method for the eccentricity of an off-axis asphere with a laser tracker," Chin. Opt. Lett. 13, S22206 (2015)

    [5] Donglin Xue, "Integrated manufacturing technology of off-axis three-mirror anastigmatic system," Chin. Opt. Lett. 12, S21202 (2014)

    Cited By

    [1] Yue Wu, Liping Wang, Jie Yu, Bo Yu, Chunshui Jin. Design method for off-axis aspheric reflective optical system with extremely low aberration and large field of view. Applied Optics, 59, 10185(2020).

    [2] Xiaoyu Chen, Yongying Yang, Chen Wang, Dong Liu, Jian Bai, Yibing Shen. Aberration calibration in high-NA spherical surfaces measurement on point diffraction interferometry. Applied Optics, 54, 3877(2015).

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    Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, M. M. Talha, "All-reflective optical system design for extreme ultraviolet lithography," Chin. Opt. Lett. 8, 1082 (2010)

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    Paper Information

    Received: May. 14, 2010

    Accepted: --

    Published Online: Dec. 3, 2010

    The Author Email:

    DOI:10.3788/COL20100811.1082

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology