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Chinese Optics Letters, Volume. 8, Issue 11, 1082(2010)

All-reflective optical system design for extreme ultraviolet lithography

Jun Chang1, Meifang Zou1, Ruirui Wang1, Shulong Feng2, and M. M. Talha1
Author Affiliations
  • 1Laboratory of Optoelectronics Technology and Information System, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China
  • 2Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 343100, China
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    The article is cited by 7 article(s) from Web of Science.
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    Jun Chang, Meifang Zou, Ruirui Wang, Shulong Feng, M. M. Talha, "All-reflective optical system design for extreme ultraviolet lithography," Chin. Opt. Lett. 8, 1082 (2010)

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    Paper Information

    Received: May. 14, 2010

    Accepted: --

    Published Online: Dec. 3, 2010

    The Author Email:

    DOI:10.3788/COL20100811.1082

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology