Concept Design of Three-Line Capillary: Possible Source for Extreme Ultraviolet Lithography

Zhang Xingqiang; Cheng Yuanli; Wang Qi

Chinese Journal of Lasers, Volume. 35, Issue s1, 81(2008)

Zhang Xingqiang^*, Cheng Yuanli, and Wang Qi

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References(3)

[2] [2] Vivek Bakshi, Rainer Lebert, Bernhard Jagle et al.. Status report on EUV source development and EVU source applications in EVUL[C].SPIE, 2007, 6533(15): 1～11

[3] [3] Takaharu Mitura, Katsuhiko Murakami, Kazuaki Suzuki et al.. Nikon EUVL development progress update[C]. SPIE, 2007, 6517(7): 1～10

[4] [4] J. J. Rocca. Table-top soft X-ray lasers[J]. Review of Scientific Instruments, 1999, 70(10): 3799～3827

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[2] Zhao Chengqiang, Xu Wendong, Hong Xiaogang, Li Xiaogang, Tang Xiaodong. Probe Inducing Surface Plasmon Resonance Nanolithographic System[J]. Acta Optica Sinica, 2009, 29(2): 473

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Zhang Xingqiang, Cheng Yuanli, Wang Qi. Concept Design of Three-Line Capillary: Possible Source for Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2008, 35(s1): 81

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Paper Information

Category: Laser physics

Received: --

Accepted: --

Published Online: Apr. 21, 2008

The Author Email: Xingqiang Zhang (zhangxinqiang.student@sina.com)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology