Chinese Journal of Lasers, Volume. 35, Issue s1, 81(2008)
Concept Design of Three-Line Capillary: Possible Source for Extreme Ultraviolet Lithography
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Zhang Xingqiang, Cheng Yuanli, Wang Qi. Concept Design of Three-Line Capillary: Possible Source for Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2008, 35(s1): 81
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