Chinese Optics Letters, Volume. 10, Issue 6, 061202(2012)
Novel technique for characterizing feature profiles in photolithography process
[1] [1] C. Archie, E. Solecky, P. Rawat, T, Brunner, K. Yoshimoto, R. Cornell, and O. Adan, Proc. SPIE 7638, 763804 (2011).
[2] [2] K. Takamasu, H. Okitou, S. Takahashi, M. Konno, O. Inoue, and H. Kawada, Proc. SPIE 7971, 797108 (2011).
[3] [3] J. Foucher, N. Rana, and C. Dezauzier, Proc. SPIE 7638, 763802 (2010).
[4] [4] B. Bilski, K. Frenner, and W. Osten, Opt. Express 19, 19967 (2011).
[5] [5] I. Gereige, S. Robert, S. Thiria, F. Badran, G. Granet, and J. J. Rousseau, J. Opt. Soc. Am. A 25, 1661 (2008).
[7] [7] C. Ko and Y. Ku, Opt. Express 14, 6001 (2006).
[8] [8] Y. Cohen, J. Finders, R. Knops, O. Mouraille, I. Minnaert-Janssen, F. Duray, E. Mos, A. Kremer, A. Sagiv, S. Mangan, M. B. Yishay, H. Dai, C. Bencher, C. Ngai, K. Dotan, and I. Englard, Proc. SPIE 7971, 79711N (2011).
[9] [9] R. M. Silver, B. M. Barnes, R. Attota, J. Jun, M. Stocker, E. Marx, and H. J. Patrick, Appl. Opt. 46, 4248 (2007).
[10] [10] T. Novikova, A. Martino, S. Hatit, and B. Drevillon, Appl. Opt. 45, 3688 (2006).
[11] [11] T. Miyakawa, K. Sentoku, K. Sato, and H. Ina, Proc. SPIE 7637, 763721 (2010),.
[12] [12] M. G. Moharam and T. K. Gaylord, J. Opt. Soc. Am. 71, 811 (1981).
[13] [13] M. G. Moharam, E. B. Grann, D. A. Pomment, and T. Gaylord, J. Opt. Soc. Am. A 12, 1068 (1995).
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Fan Wang, Hailiang Lu, Qingyun Zhang, Anatoly Burov, "Novel technique for characterizing feature profiles in photolithography process," Chin. Opt. Lett. 10, 061202 (2012)
Category: Instrumentation, measurement, and metrology
Received: Nov. 15, 2011
Accepted: Dec. 28, 2011
Published Online: Mar. 13, 2012
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