Optoelectronic Technology, Volume. 44, Issue 2, 116(2024)

A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask

Wenjing ZHANG1, Kaixin ZHANG1, Tianxi YANG2, Jie SUN1,3, Qun YAN2, Chang LIN2, Bingxin JIANG1, Yang LI1, Jinhua LAN1, and Hui CHEN1
Author Affiliations
  • 1National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN
  • 2Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350100, CHN
  • 3Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden
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    References(7)

    [2] Baek D, Lee S H, Jun B H et al. Lithography technology for micro- and nanofabrication[J]. Nanotechnology for Bioapplications, 1309, 217-233(2021).

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    [4] Zhao X, Xu F, Tang L et al. Microfluidic chip-based C elegans microinjection system for investigating cell-cell communication in vivo[J]. Biosensors & Bioelectronics, 50, 28-34(2013).

    [7] Schneider A, Su B, Button T W et al. Comparison of PMMA and SU-8 resist moulds for embossing of PZT to produce high-aspect-ratio microstructures using LIGA process[J]. Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, 8, 88-92(2002).

    [8] Gabor A H, Felix N M. Overlay error statistics for multiple-exposure patterning[J]. Journal of Micro-Nanolithography Mems and Moems, 18(2019).

    [9] Perumal V, Hashim U, Adam T. Mask design and fabrication of micro/nanowire biochip for reliable and repeatability pattern transfer[J]. International Conference on Nanoscience and Nanotechnology, 832, 79-83(2013).

    [10] Orji N G, Badaroglu M, Barnes B M et al. Metrology for the next generation of semiconductor devices[J]. Nature Electronics, 1, 662(2018).

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    Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116

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    Paper Information

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    Received: Oct. 16, 2023

    Accepted: --

    Published Online: Jul. 19, 2024

    The Author Email:

    DOI:10.12450/j.gdzjs.202402006

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