Optoelectronic Technology, Volume. 44, Issue 2, 116(2024)
A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask
Fig. 3. Optical picture of the target pattern under the lithographic microscope system
Fig. 5. The results of the first alignment exposure and development
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Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116
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Received: Oct. 16, 2023
Accepted: --
Published Online: Jul. 19, 2024
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