Optoelectronic Technology, Volume. 44, Issue 2, 116(2024)

A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask

Wenjing ZHANG1, Kaixin ZHANG1, Tianxi YANG2, Jie SUN1,3, Qun YAN2, Chang LIN2, Bingxin JIANG1, Yang LI1, Jinhua LAN1, and Hui CHEN1
Author Affiliations
  • 1National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN
  • 2Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350100, CHN
  • 3Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden
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    Figures & Tables(9)
    The selected alignment mark
    Alignment process of overlay
    Optical picture of the target pattern under the lithographic microscope system
    Photos of the first alignment
    The results of the first alignment exposure and development
    Photos of the second alignment
    Photos of the second alignment calibration
    The results of the second alignment calibration exposure
    Optical images after using the calibration scheme
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    Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116

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    Paper Information

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    Received: Oct. 16, 2023

    Accepted: --

    Published Online: Jul. 19, 2024

    The Author Email:

    DOI:10.12450/j.gdzjs.202402006

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