A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask

Wenjing ZHANG; Kaixin ZHANG; Tianxi YANG; Jie SUN; Qun YAN; Chang LIN; Bingxin JIANG; Yang LI; Jinhua LAN; Hui CHEN

doi:10.12450/j.gdzjs.202402006

Optoelectronic Technology, Volume. 44, Issue 2, 116(2024)

A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask

Wenjing ZHANG¹, Kaixin ZHANG¹, Tianxi YANG², Jie SUN^1,3, Qun YAN², Chang LIN², Bingxin JIANG¹, Yang LI¹, Jinhua LAN¹, and Hui CHEN¹

Author Affiliations

¹National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN

²Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350100, CHN

³Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden

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Abstract Get PDF(in Chinese)

A calibration scheme was proposed that made appropriate adjustments based on the general steps of lithography exposure and achieved accurate lithography exposure using incompletely matched masks. This study provided a new approach to improving chip preparation efficiency and ensuring alignment accuracy.

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Keywords

calibration cross⁃engraving exposure integrated circuit lithography process

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Wenjing ZHANG, Kaixin ZHANG, Tianxi YANG, Jie SUN, Qun YAN, Chang LIN, Bingxin JIANG, Yang LI, Jinhua LAN, Hui CHEN. A Calibration Scheme for Chip Engraving Based on Imperfectly Matched Mask[J]. Optoelectronic Technology, 2024, 44(2): 116

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Paper Information

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Received: Oct. 16, 2023

Accepted: --

Published Online: Jul. 19, 2024

The Author Email:

DOI:10.12450/j.gdzjs.202402006

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology