Chinese Journal of Lasers, Volume. 51, Issue 12, 1202411(2024)
Photoresist for Laser Additive Manufacturing: Status, Challenges, and Opportunities (Invited)
[14] Dong B, Zhang J, Wang D W et al. Femtosecond laser micromachining optical devices[J]. Opto-Electronic Engineering, 50, 220073(2023).
[125] Dong X C, Du C L. Study on lithography of negative resists[J]. Acta Photonica Sinica, 32, 1422-1425(2003).
Get Citation
Copy Citation Text
Bingrui Liu, Yucong Huang, Zhibin Wu, Dong Wu. Photoresist for Laser Additive Manufacturing: Status, Challenges, and Opportunities (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202411
Category: Laser Micro-Nano Manufacturing
Received: Mar. 13, 2024
Accepted: Apr. 22, 2024
Published Online: Jun. 6, 2024
The Author Email: Liu Bingrui (brliu@ahau.edu.cn)
CSTR:32183.14.CJL240679