Chinese Journal of Lasers, Volume. 51, Issue 12, 1202411(2024)

Photoresist for Laser Additive Manufacturing: Status, Challenges, and Opportunities (Invited)

Bingrui Liu1,2、*, Yucong Huang2, Zhibin Wu1, and Dong Wu1
Author Affiliations
  • 1Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026, Anhui , China
  • 2School of Resources and Environment, Anhui Agricultural University, Hefei 230036, Anhui , China
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    Figures & Tables(12)
    Photochemical reaction and direct laser writing process. (a) Schematic diagram of the preparation of positive and negative photoresists; (b) schematic diagram of direct laser writing
    Basic two-photon polymerization micro-nano processing system[28]
    Study on the mechanism and application of two-photon polymerization of olefin photoresist. (a) Polymerization mechanism of olefin photoresist[40]; (b) manufacturing process of magnetic control micro-nano rotor[42]; (c) schematic illustration of the 3D nanofabrication based on two-photon lithography[43]; (d) the main polymerization reaction for pH responsed hydrogel involved in the printing process and the schematic of the 4D-DLW process[44]; (e) a switchable capillary-force self-assembly strategy based on a temperature-responsive hydrogel is proposed to construct 2D and 3D microstructures[45]; (f) a density distribution controllable femtosecond Bessel beam is generated, and then a pH-responsive microactuator composed of bendable hydrogel microtubes has been successfully fabricated[46]
    Study on polymerization mechanism and application of thiol‒olefin photoresist. (a) Cycles showing reactions of thiol‒ene‒acrylate polymerization[52]; (b) a model of ternary mercaptan/acrylate copolymerization of acrylate, mercaptan olefin and mercaptan acrylate[53]; (c) schematic diagram of photocrosslinking and photodegradation of 4-arm PEG-SH and Bimane norbornene, and photodegradation of 3D printed boxing ring structure[54]
    Research on processing and application of inorganic monomer photoresist. (a) Photoreduction synthesis of different metal materials is realized by different lasers[71]; (b) nanoscale additive manufacturing process of metal and two-photon lithography (TPL) process[72]; (c) schematic diagram of the AM by a two-photon polymerization and subsequent 650 ℃ heat treatment[80]; (d) micrographs of the printed fused silica structure[80]; (e) construction of glass microstructure by laser 3D printing PDMS network[81]
    Research on processing and application of heterogeneous monomer photoresists. (a) Schematic illustration showing 3D nanoprinting of MPA-capped CdSe/ZnS QDs using photoexcitation-induced chemical bonding[84]; (b) scheme illustrating 3D printing of inorganic nanomaterials from a solution containing NCs (blue spheres) and bisazides using a femtosecond laser[85]; (c) two-photon additive manufacturing schematic diagram and chemical structure of BTMST and ZrO2 hybrid photoresist[86]
    Common organic photoinitiators. (a) Two modes of organic photoinitiator to produce free radicals after absorbing photons; (b) coumarin-based organic photoinitiator[72]; (c) organic photoinitiator based on phosphine oxide[100]; (d) benzophenone-based organic photoinitiator[101]
    Applications of inorganic photoinitiators. (a) Multifunctional photopolymer nanocomposites based on ZnO quantum photoinitiator[104]; (b) TEM images of ZnO nanorods[104]; (c) the formula of 3D printed PEGDA hydrogel[104]; (d) schematic diagram of different types of photopolymerization in two-photon AM based on nanoclusters (Ag28Pt)[110]; (e) comparison of photoexcitation mechanisms between nanocluster photoinitiators (left) and typical organic photoinitiators (right)[110]
    Study on two-step absorption (TSA) mechanism and photoinitiators. (a) TSA mechanism based on benzoyl derivatives as photoinitiators[115]; (b) photoinitiators that can be excited by 405 nm blue light after screening for additive manufacturing[90]; (c) a photoinitiators that can be used for additive manufacturing by simultaneous excitation of 405 nm blue light and 640 nm red light after screening[90]; (d) schematic diagram of triplet‒triplet annihilation (TTA) processing, and formulation and UV-vis absorption spectra of the photoresist using in the TTA laser AM process[120]
    A simple illustration of the concept of 4D printing[126]
    Schematic diagram of super-resolution processing and characteristics after processing[140]
    Multi-focus additive manufacturing technology. (a) Printing process of a 3×3 octahedral truss structure via multi-focus scanning[142]; (b) optical configuration and fabrication principle of the multi-foci fast scanning system[143]
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    Bingrui Liu, Yucong Huang, Zhibin Wu, Dong Wu. Photoresist for Laser Additive Manufacturing: Status, Challenges, and Opportunities (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202411

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    Paper Information

    Category: Laser Micro-Nano Manufacturing

    Received: Mar. 13, 2024

    Accepted: Apr. 22, 2024

    Published Online: Jun. 6, 2024

    The Author Email: Liu Bingrui (brliu@ahau.edu.cn)

    DOI:10.3788/CJL240679

    CSTR:32183.14.CJL240679

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