Fig. 1. Schematic diagram of the pulsed capacitively coupled plasma apparatus equipped with an emissive probe system.

Fig. 2. A plot of measured floating potential (V_f) versus heating current (I_ht) in a CCP discharge in a continuous wave mode. The measurements were carried out at argon plasma with pressure of 3.0 Pa and input power of 50 W.

Fig. 3. The data measured by an emissive probe in an argon plasma with a discharge pressure of 3.0 Pa and a pulsed RF power of 30 W: (a) Temporal evolution of floating potential and plasma potential; (b) temporal evolution of electron temperature. The discharge was pulsed at 500 Hz with 50% duty cycle.

Fig. 4. A plot of temporal evolution of plasma potential and electron temperature: (a) plasma potential (V_p) with power (3 Pa); (b) plasma potential (V_p) with pressure (50 W); (c) electron temperature (T_e) with power (3 Pa); (d) electron temperature (T_e) with pressure (50 W). The measurements are carried out at argon plasma and the discharge is pulsed at 500 Hz with 50% duty cycle.

Fig. 5. The plasma potential and electron temperature in each stage under different discharge conditions. The four figures correspond to (a), (b), (c), and (d) in Fig. 4, respectively.