Journal of Infrared and Millimeter Waves, Volume. 40, Issue 2, 184(2021)

Three-dimensional structure analysis of Schottky barrier diode in CMOS technology for terahertz imaging

Da-Sheng CUI*, Jia-Ming YANG, Hong-Xuan YAO, and Xin LYU
Author Affiliations
  • Beijing Key Laboratory of Millimeter Wave and Terahertz Technology, School of Information and Electrics, Beijing Institute of Technology, Beijing 100081, China
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    References(17)

    [13] Chang W L, Meng C, Huang G W. SBD layout optimization with effect of N-well to p-substrate pn junctions in 0.18 μm CMOS process[C](2016).

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    Da-Sheng CUI, Jia-Ming YANG, Hong-Xuan YAO, Xin LYU. Three-dimensional structure analysis of Schottky barrier diode in CMOS technology for terahertz imaging[J]. Journal of Infrared and Millimeter Waves, 2021, 40(2): 184

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    Paper Information

    Category: Research Articles

    Received: Jun. 29, 2020

    Accepted: --

    Published Online: Aug. 31, 2021

    The Author Email: Da-Sheng CUI (dscui@bit.edu.cn)

    DOI:10.11972/j.issn.1001-9014.2021.02.008

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