Journal of Synthetic Crystals, Volume. 50, Issue 6, 1002(2021)

Numerical Simulation Study on Growth Rate and Gas Reaction Path of AlN-MOCVD with Close-Coupled Showerhead Reactor

WAN Xu and ZUO Ran
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  • [in Chinese]
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    References(12)

    [3] [3] LI S L, WANG H, ZHANG J, et al. The effects of growth temperature of the pulse atomic layer epitaxy AlN films grown on sapphire by MOCVD[J]. Proceedings of SPIE - The International Society for Optical Engineering, 2011, 8333: 52.

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    [8] [8] LOBANOVA A V, MAZAEV K M, TALALAEV R A, et al. Effect of Ⅴ/Ⅲ ratio in AlN and AlGaN MOVPE[J]. Journal of Crystal Growth, 2006, 287(2): 601-604.

    [9] [9] ZHAO D G, ZHU J J, JIANG D S, et al. Parasitic reaction and its effect on the growth rate of AlN by metalorganic chemical vapor deposition[J]. Journal of Crystal Growth, 2006, 289(1): 72-75.

    [10] [10] INAGAKI Y, KOZAWA T. Chemical reaction pathways for MOVPE growth of aluminum nitride[J]. ECS Journal of Solid State Science and Technology, 2015, 5(2): P73-P75.

    [11] [11] WU H L, ZHAO W, HE C G, et al. Growth of high quality AlN/sapphire templates with high growth rate using a medium-temperature layer[J]. Superlattices and Microstructures, 2019, 125: 343-347.

    [14] [14] NAKAMURA K, MAKINO O, TACHIBANA A, et al. Quantum chemical study of parasitic reaction in Ⅲ-Ⅴ nitride semiconductor crystal growth[J]. Journal of Organometallic Chemistry, 2000, 611(1/2): 514-524.

    [15] [15] RANDALL CREIGHTON J, WANG G T, COLTRIN M E. Fundamental chemistry and modeling of group-Ⅲ nitride MOVPE[J]. Journal of Crystal Growth, 2007, 298: 2-7.

    [16] [16] ZUO R, ZHANG H, WANG B L, et al. Quantum chemistry study on the adduct reaction paths as functions of temperature in GaN/AlN MOVPE growth[J]. ECS Journal of Solid State Science and Technology, 2016, 5(12): P667-P673.

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    WAN Xu, ZUO Ran. Numerical Simulation Study on Growth Rate and Gas Reaction Path of AlN-MOCVD with Close-Coupled Showerhead Reactor[J]. Journal of Synthetic Crystals, 2021, 50(6): 1002

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    Paper Information

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    Received: Apr. 12, 2021

    Accepted: --

    Published Online: Aug. 23, 2021

    The Author Email:

    DOI:

    CSTR:32186.14.

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