Lithographic Tool-Matching Method Based on Differential Evolution Algorithm

Yanjie Mao; Sikun Li; Xiangzhao Wang; Yayi Wei

doi:10.3788/AOS201939.1222002

Acta Optica Sinica, Volume. 39, Issue 12, 1222002(2019)

Lithographic Tool-Matching Method Based on Differential Evolution Algorithm

Yanjie Mao^1,2, Sikun Li^1,2、*, Xiangzhao Wang^1,2、**, and Yayi Wei³

¹Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Science, Beijing 100029, China;

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Figures & Tables(14)

Fig. 1. Schematic of freeform illumination source system based on MMA

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Fig. 2. Schematic of freeform illumination source model based on MMA. (a) Light spot formed by single micro mirror; (b) ideal source formed by MMA; (c) target source

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Fig. 3. Matching flowchart of lithography machine based on DE algorithm

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Fig. 4. Partial settings of lithography matching. (a) Wave aberration of TBM lithography; (b) reference source of quasar illumination; (c) one-dimensional line/space mask with 45 nm CD

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Fig. 5. Illumination source after matching based on PSO-SA. (a) Source after source optimization; (b) source reconstructed after generating parameters through MAA; (c) difference between SO optimization source and source generated by MAA

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Fig. 6. CD error versus pitch before and after PSO optimization

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Fig. 7. Illumination source after matching. (a) Source reconstructed by GA-SA matching; (b) source after matching by proposed method; (c) MMA ideal source distribution

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Fig. 8. CD error versus pitch before and after matching. (a) H direction; (b) V direction

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Fig. 9. Convergence curves of different matching methods

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Fig. 10. Sources before and after matching. (a) Reference source of freeform illumination; (b) source after matching by GA-SA; (c) source after matching by PSO-SA; (d) source after matching by proposed method

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Fig. 11. CD error before and after matching

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Fig. 12. Convergence curves before and after matching

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Table 1. Simulation results under quasar illumination matching
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Table 1. Simulation results under quasar illumination matching
Method CD error after SO /nm CD error after MAA /nm Source error R_PF /%
Pre-matching 10.67
PSO-SA 0.354 0.491 0.0259 13.52
GA-SA 1.007 1.099 0.0343 14.82
Proposed method 0.271 10.65

Table 2. Simulation results under freeform illumination matching
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Table 2. Simulation results under freeform illumination matching
Method CD error after SO /nm CD error after MAA /nm Source error R_PF /%
Pre-matching 3.65
PSO-SA 0.339 0.478 0.0285 2.85
GA-SA 0.881 0.985 0.0217 6.13
Proposed method 0.329 3.61

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Yanjie Mao, Sikun Li, Xiangzhao Wang, Yayi Wei. Lithographic Tool-Matching Method Based on Differential Evolution Algorithm[J]. Acta Optica Sinica, 2019, 39(12): 1222002

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