Structural, Optical, Chemical and Laser Damage Resistant Properties of HfO<sub>2</sub> Films Deposited by Reactive Electron Beam Evaporation

Yu Zhen; Zhang Weili; Zhu Rui; Qi Hongji

doi:10.3788/CJL202047.0403002

Chinese Journal of Lasers, Volume. 47, Issue 4, 403002(2020)

Structural, Optical, Chemical and Laser Damage Resistant Properties of HfO₂ Films Deposited by Reactive Electron Beam Evaporation

Yu Zhen^1,2,3, Zhang Weili^1,3, Zhu Rui^1,3, and Qi Hongji^3、*

Author Affiliations

¹Thin Film Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences,Beijing 100049, China

³Key Laboratory of High Power Laser Materials, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China

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Yu Zhen, Zhang Weili, Zhu Rui, Qi Hongji. Structural, Optical, Chemical and Laser Damage Resistant Properties of HfO₂ Films Deposited by Reactive Electron Beam Evaporation[J]. Chinese Journal of Lasers, 2020, 47(4): 403002

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Paper Information

Category: materials and thin films

Received: Sep. 14, 2019

Accepted: --

Published Online: Apr. 8, 2020

The Author Email: Hongji Qi (qhj@siom.ac.cn)

DOI:10.3788/CJL202047.0403002

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology