Chinese Journal of Lasers, Volume. 52, Issue 18, 1803031(2025)
Fabrication and Characterizations of 12-inch n-Type 4H-SiC Single Crystal Substrates (Invited)
Fig. 2. Temperature fields corresponding to diameter expansion and quality optimization stages of 12-inch single crystal
Fig. 4. Photographs of seed crystal in various sizes during diameter expansion process
Fig. 5. Photos showing n-type 12-inch 4H-SiC crystal ingot and substrate. (a) Crystal ingot; (b) substrate
Fig. 9. High-resolution XRD rocking curves of (004) plane for 12-inch 4H-SiC substrate
Fig. 10. TSD distribution in 12-inch 4H-SiC substrate (left) and enlarged dislocations morphology (right)
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Xianglong Yang, Xixi Xiong, Jiaxin Zhang, Hongyu Shao, Xiufang Chen, Xuejian Xie, Rongkun Wang, Xiufei Hu, Guanglei Zhong, Guojian Yu, Guojie Hu, Muqing Zhang, Xiaobo Hu, Xiangang Xu. Fabrication and Characterizations of 12-inch n-Type 4H-SiC Single Crystal Substrates (Invited)[J]. Chinese Journal of Lasers, 2025, 52(18): 1803031
Category: Materials
Received: Jun. 23, 2025
Accepted: Jul. 21, 2025
Published Online: Sep. 17, 2025
The Author Email: Xianglong Yang (yangxl2016@sdu.edu.cn), Xiufang Chen (cxf@sdu.edu.cn), Xiangang Xu (xxu@sdu.edu.cn)
CSTR:32183.14.CJL250987