Chinese Journal of Lasers, Volume. 52, Issue 18, 1803031(2025)

Fabrication and Characterizations of 12-inch n-Type 4H-SiC Single Crystal Substrates (Invited)

Xianglong Yang1,2、***, Xixi Xiong1,2, Jiaxin Zhang1,2, Hongyu Shao1,2, Xiufang Chen1,2、*, Xuejian Xie1,2, Rongkun Wang1,2, Xiufei Hu1,2, Guanglei Zhong1,2, Guojian Yu3, Guojie Hu3, Muqing Zhang3, Xiaobo Hu1,2, and Xiangang Xu1,2、**
Author Affiliations
  • 1State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, Shandong , China
  • 2Institute of Novel Semiconductors, Shandong University, Jinan 250100, Shandong , China
  • 3Guangzhou Summit Crystal Semiconductor Co,. Ltd., Guangzhou 511458, Guangdong , China
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    Figures & Tables(10)
    Assembly drawing of SiC single crystal growth
    Temperature fields corresponding to diameter expansion and quality optimization stages of 12-inch single crystal
    Schematic diagram of SiC diameter expansion (8 inch to 12 inch)
    Photographs of seed crystal in various sizes during diameter expansion process
    Photos showing n-type 12-inch 4H-SiC crystal ingot and substrate. (a) Crystal ingot; (b) substrate
    Raman mapping of 12-inch n-type 4H-SiC substrate
    Micropipes (red dots) in the 12-inch n-type 4H-SiC substrate
    Resistivity mapping of 12-inch n-type 4H-SiC substrate
    High-resolution XRD rocking curves of (004) plane for 12-inch 4H-SiC substrate
    TSD distribution in 12-inch 4H-SiC substrate (left) and enlarged dislocations morphology (right)
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    Xianglong Yang, Xixi Xiong, Jiaxin Zhang, Hongyu Shao, Xiufang Chen, Xuejian Xie, Rongkun Wang, Xiufei Hu, Guanglei Zhong, Guojian Yu, Guojie Hu, Muqing Zhang, Xiaobo Hu, Xiangang Xu. Fabrication and Characterizations of 12-inch n-Type 4H-SiC Single Crystal Substrates (Invited)[J]. Chinese Journal of Lasers, 2025, 52(18): 1803031

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    Paper Information

    Category: Materials

    Received: Jun. 23, 2025

    Accepted: Jul. 21, 2025

    Published Online: Sep. 17, 2025

    The Author Email: Xianglong Yang (yangxl2016@sdu.edu.cn), Xiufang Chen (cxf@sdu.edu.cn), Xiangang Xu (xxu@sdu.edu.cn)

    DOI:10.3788/CJL250987

    CSTR:32183.14.CJL250987

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