Laser & Optoelectronics Progress, Volume. 59, Issue 19, 1931001(2022)

Preparing H4 Films and Their Laser Damage Resistance Deposited Using Ion-Beam-Assisted Electron Beam Evaporation

Xiaoxue Li1, Lingcheng Huang2, and Yongqin Hao1、*
Author Affiliations
  • 1State Key Laboratory of High Power Semiconductor Laser, Changchun University of Science and Technology,Changchun 130022, Jilin, China
  • 2Beijing Opto-Electronics Technology Co., Ltd., Beijing 100015, China
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    Xiaoxue Li, Lingcheng Huang, Yongqin Hao. Preparing H4 Films and Their Laser Damage Resistance Deposited Using Ion-Beam-Assisted Electron Beam Evaporation[J]. Laser & Optoelectronics Progress, 2022, 59(19): 1931001

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    Paper Information

    Category: Thin Films

    Received: Aug. 2, 2021

    Accepted: Sep. 24, 2021

    Published Online: Oct. 11, 2022

    The Author Email: Yongqin Hao (hyq72081220@aliyun.com)

    DOI:10.3788/LOP202259.1931001

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