Laser & Optoelectronics Progress, Volume. 54, Issue 11, 111201(2017)

Comparative Study on In-Situ Infrared Thermometry of GaN Epitaxy on Different Substrates Prepared by MOCVD

Yang Chaopu1,2, Song Yafeng3, Fang Wenqing4、*, Liu Mingbao1,2, Li Chun1,2, and Zhang Meili1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    References(14)

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    [8] [8] Lu Mengxi, Cao Jian. Application of infrared measurement technology in MOCVD[J]. Semiconductor Technology, 2007, 32(8): 689-691.

    [9] [9] Yang Zheng, Yang Li, Zhang Shicheng, et al. Infrared temperature measurement technology on lambertian based on the dual temperature and dual-band method[J]. Journal of Engineering Thermophysics, 2013, 34(11): 2132-2135.

    [11] [11] Li Yang, Xia Xinlin, Fan Chao, et al. Error analysis of infrared temperature measurement for 3D non-isothermal porous layer[J]. Acta Optica Sinica, 2017, 37(5): 0504001.

    [12] [12] Yang Chaopu, Fang Wenqing. Influence of atmosphere and pressures on infrared temperature measurement of MOCVD reactor[J]. Journal of Shangluo University, 2015, 29(4): 43-46.

    [13] [13] Palik E D. Handbook of optical constants of solids[M]. Boston: Academic Press, 1985.

    [14] [14] Yu G, Wang G, Ishikawa H, et al. Optical properties of wurzite structure GaN on sapphire around fundamental absorption edge (0.78-4.77 eV) by spectroscopic ellipsometry and the optical transmission method[J]. Applied Physics Letters, 1997, 70(24): 3209-3211.

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    Yang Chaopu, Song Yafeng, Fang Wenqing, Liu Mingbao, Li Chun, Zhang Meili. Comparative Study on In-Situ Infrared Thermometry of GaN Epitaxy on Different Substrates Prepared by MOCVD[J]. Laser & Optoelectronics Progress, 2017, 54(11): 111201

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: May. 9, 2017

    Accepted: --

    Published Online: Nov. 17, 2017

    The Author Email: Fang Wenqing (fwq@ncu.edu.cn)

    DOI:10.3788/lop54.111201

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