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Laser & Optoelectronics Progress, Volume. 61, Issue 15, 1508001(2024)

Research on Uniformity of Illumination Field Intensity in Fourier Synthesis Illumination

Hui Li^1,2, Yueyang Ma^1,2, Haoyu Yin^1,2, Xiaoquan Han^1,2, Yufeng Huang^1,2, and Xiaobin Wu^1,2、*

Author Affiliations

¹R & D Center of Optoelectronic Technology, Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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References (14)

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References(14)

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[4] Xiao Y F, Zhu J, Yang B X et al. Design of micro-cylindrical-lens array used for illumination uniformization in lithography systems[J]. Chinese Journal of Lasers, 40, 0216001(2013).

[5] Cheng W L, Zhang F, Lin D L et al. High precision correction method of illumination field uniformity for photolithography illumination system[J]. Acta Optica Sinica, 38, 0722001(2018).

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[7] Li H, Wu X B, Han X Q et al. Lithography illumination system based on Fourier synthesis technology[J]. Chinese Journal of Lasers, 50, 0605003(2023).

[8] Naulleau P P, Goldberg K A, Batson P et al. Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography[J]. Applied Optics, 42, 820-826(2003).

[9] Zhang W, Gong Y. Design of diffractive optical elements for off-axis illumination in projection lithography[J]. Optics and Precision Engineering, 16, 2081-2086(2008).

[10] Wang J, Jin C S, Wang L P et al. Study on the off-axis illumination for extreme ultraviolet lithography[J]. Acta Optica Sinica, 32, 1211003(2012).

[11] Akram M N, Tong Z M, Ouyang G M et al. Laser speckle reduction due to spatial and angular diversity introduced by fast scanning micromirror[J]. Applied Optics, 49, 3297-3304(2010).

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[14] Gong S, Yang B X, Huang H J. Optimization design of illumination uniformity of relay lens in lithography illumination system[J]. Acta Photonica Sinica, 51, 0322001(2022).

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Hui Li, Yueyang Ma, Haoyu Yin, Xiaoquan Han, Yufeng Huang, Xiaobin Wu. Research on Uniformity of Illumination Field Intensity in Fourier Synthesis Illumination[J]. Laser & Optoelectronics Progress, 2024, 61(15): 1508001

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Paper Information

Category: Geometric Optics

Received: Jul. 7, 2023

Accepted: Jul. 24, 2023

Published Online: Aug. 12, 2024

The Author Email: Xiaobin Wu (wuxiaobin@ime.ac.cn)

DOI:10.3788/LOP231676

CSTR:32186.14.LOP231676

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology